This course is an introduction to the physics, chemistry and materials of integrated circuit fabrication. Topics include the basic process steps of crystal growth, oxidation, photolithography, diffusion, ion implantation, chemical vapor deposition (CVD) and metallization used to build integrated circuits. The laboratory uses a 4-level metal gate PMOS process to fabricate a working integrated circuit test-chip and provide experience in device design, process design, materials evaluation, in-process characterization and device testing.