Description:
This course is an introduction to the physics,
chemistry and materials of integrated circuit fabrication. Topics include the basic process steps of
crystal growth, oxidation, photolithography, diffusion, ion implantation,
chemical vapor deposition (CVD) and metallization used to build integrated
circuits. The laboratory uses a 4-level
metal gate PMOS process to fabricate a working integrated circuit test-chip and
provide experience in device design, process design, materials evaluation, in-process characterization and device testing.